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    Title :

    A novel method to overcome photoresist collapse with high aspect ratio structures


    Contributors:
    Yu, M. (author) / Zhao, S. (author) / Gao, C. (author) / Guo, X. (author) / Xu, X. (author) / Shi, Y. (author) / Jing, Y. (author) / Chen, B. (author)

    Published in:

    MICROSYSTEM TECHNOLOGIES ; 20 , 12 ; 2185-2189


    Publication date :

    2014-01-01


    Size :

    5 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    629.83



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