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    Title :

    Aqueous base developable: easy stripping, high aspect ratio negative photoresist for optical and proton beam lithography


    Contributors:

    Published in:

    MICROSYSTEM TECHNOLOGIES ; 14 , 9-11 ; 1423-1428


    Publication date :

    2008-01-01


    Size :

    6 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    629.83



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