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    Title :

    Novel positive-tone thick photoresist for high aspect ratio microsystem technology


    Contributors:
    Hsieh, G.-W. (author) / Hsieh, Y.-S. (author) / Yang, C.-R. (author) / Lee, Y.-D. (author)

    Published in:

    Publication date :

    2002-01-01


    Size :

    4 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    629.83



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