Summary form only given. In-situ process combines film growth and device fabrication steps which take place under an ultra high vacuum or a controlled ambient environment. Results of materials and devices produced using this technique with molecular beam epitaxy are reviewed.


    Access

    Check access

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Recent advances of in-situ process in molecular beam epitaxy


    Contributors:
    Hong, M. (author)

    Published in:

    Proceedings of LEOS'94 ; 2 ; 348 vol.2


    Publication date :

    1994-01-01


    Size :

    23217 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



    Recent Advances of In-Situ Process in Molecular Beam Epitaxy

    IEEE; Lasers and Electro-Optics Society | British Library Conference Proceedings | 1994



    Recent Advances in Chemical Beam Epitaxy for Opto-Electronic Device Applications

    IEEE; Lasers and Electro-Optics Society | British Library Conference Proceedings | 1993


    Molecular-Beam-Epitaxy Program

    Sparks, Patricia D. | NTRS | 1988


    Molecular-beam epitaxy in space

    Arthur, J.R. | Tema Archive | 1977