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    Title :

    High precision, low cost mask for deep x-ray lithography


    Contributors:
    Shew, B.-Y. (author) / Cheng, Y. (author) / Shih, W.-P. (author) / Lu, M. (author) / Lee, W. H. (author)

    Published in:

    Publication date :

    1998-01-01


    Size :

    4 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    629.83



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