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    Title :

    Holographic lithography needs no mask


    Contributors:
    Nole, J. (author)

    Published in:

    LASER FOCUS WORLD ; 33 , 5 ; 209-214


    Publication date :

    1997-01-01


    Size :

    6 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    621.366



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    Microcircuit lithography using holographic imaging

    Chen, Ray T. / Aye, Tin M. / Sadovnik, Lev S. et al. | SPIE | 1990


    The holographic mask aligner

    Gray, S. / Clube, F. / Struchen, D. et al. | British Library Conference Proceedings | 1993