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    Title :

    Advanced mask aligner lithography (AMALITH) for thick photoresist


    Contributors:
    Voelkel, R. (author) / Vogler, U. (author) / Bramati, A. (author) / Hennemeyer, M. (author) / Zoberbier, R. (author) / Voigt, A. (author) / Grützner, G. (author) / Ünal, N. (author) / Hofmann, U. (author)

    Published in:

    MICROSYSTEM TECHNOLOGIES ; 20 , 10-11 ; 1839-1842


    Publication date :

    2014-01-01


    Size :

    4 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    629.83



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