WB2.4 Realization of High Aspect Ratio Nano-Pillar Type Photonic Crystal by Deep Reactive Ion Etching
Optical interconnects & VLSI photonics ; 2004 ; San Diego, Calif
2004-01-01
2 pages
IEEE cat. no. 04TH8728. Held as part of the 2004 IEEE/LEOS Summer topical meeting
Conference paper
English
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