In this paper realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching. Sidewall scallops that determines the roughness on the nanopillars were also investigated for the different height and depths obtained through varying process parameters.


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    Title :

    Realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching


    Contributors:
    Teo, H.G. (author) / Yu, M.B. (author) / Singh, J. (author) / Ranga, N. (author) / Li, J. (author) / Yew, W.C. (author) / Liu, A.Q. (author)


    Publication date :

    2004-01-01


    Size :

    338220 byte





    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English




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