In this paper realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching. Sidewall scallops that determines the roughness on the nanopillars were also investigated for the different height and depths obtained through varying process parameters.


    Zugriff

    Zugriff prüfen

    Verfügbarkeit in meiner Bibliothek prüfen

    Bestellung bei Subito €


    Exportieren, teilen und zitieren



    Titel :

    Realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching


    Beteiligte:
    Teo, H.G. (Autor:in) / Yu, M.B. (Autor:in) / Singh, J. (Autor:in) / Ranga, N. (Autor:in) / Li, J. (Autor:in) / Yew, W.C. (Autor:in) / Liu, A.Q. (Autor:in)


    Erscheinungsdatum :

    2004-01-01


    Format / Umfang :

    338220 byte





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch




    Numerical characterization of nanopillar photonic crystal waveguides and directional couplers

    Chigrin, D. N. / Lavrinenko, A. V. / Torres, C. M. | British Library Online Contents | 2005



    High aspect ratio micromachining by synchrotron radiation direct photo-etching

    Katoh, T. / Zhang, Y. | British Library Online Contents | 1998


    Applications for nanopillar structures

    HALL MARK D / SHROFF MEHUL D | Europäisches Patentamt | 2017

    Freier Zugriff