In this paper realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching. Sidewall scallops that determines the roughness on the nanopillars were also investigated for the different height and depths obtained through varying process parameters.
Realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching
01.01.2004
338220 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
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