In this paper realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching. Sidewall scallops that determines the roughness on the nanopillars were also investigated for the different height and depths obtained through varying process parameters.


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    Titel :

    Realization of high aspect ratio nanopillar type photonic crystal by deep reactive ion etching


    Beteiligte:
    Teo, H.G. (Autor:in) / Yu, M.B. (Autor:in) / Singh, J. (Autor:in) / Ranga, N. (Autor:in) / Li, J. (Autor:in) / Yew, W.C. (Autor:in) / Liu, A.Q. (Autor:in)


    Erscheinungsdatum :

    01.01.2004


    Format / Umfang :

    338220 byte





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch




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