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    Title :

    The potential of sonicated water in the cleaning processes of silicon wafers




    Publication date :

    2011



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English



    Classification :

    BKL:    53.36 Energiedirektumwandler, elektrische Energiespeicher / 52.52 Thermische Energieerzeugung, Wärmetechnik / 52.56 Regenerative Energieformen, alternative Energieformen / 50.70 Energie: Allgemeines



    A THRESHOLD MODEL FOR LASER CLEANING OF LARGER SILICON WAFERS

    Wang, Xuyue / Kang, Renke / Xu, Wenji et al. | British Library Online Contents | 2011


    A THRESHOLD MODEL FOR LASER CLEANING OF LARGER SILICON WAFERS

    Wang, X. / Kang, R. / Xu, W. et al. | British Library Online Contents | 2011



    Smoother Scribing of Silicon Wafers

    Danyluk, S. | NTRS | 1986


    Reciprocating Saw for Silicon Wafers

    Morrison, A. D. / Collins, E. R., Jr. | NTRS | 1985