Reactor utilizes multiple stacked trays compactly arranged in paths of horizontally channeled reactant gas streams. Design allows faster and more efficient deposits of film on substrates, and reduces gas and energy consumption. Lack of dead spots that trap reactive gases reduces reactor purge time.
Chemical-vapor-deposition reactor
NASA Tech Briefs ; 4 , 1
1979-08-01
Miscellaneous
No indication
English
HIGH EFFICIENCY EPITAXIAL CHEMICAL VAPOR DEPOSITION (CVD) REACTOR
European Patent Office | 2016
|Automatic chemical vapor deposition
NTRS | 1981
|