Reactor utilizes multiple stacked trays compactly arranged in paths of horizontally channeled reactant gas streams. Design allows faster and more efficient deposits of film on substrates, and reduces gas and energy consumption. Lack of dead spots that trap reactive gases reduces reactor purge time.
Chemical-vapor-deposition reactor
NASA Tech Briefs ; 4 , 1
01.08.1979
Sonstige
Keine Angabe
Englisch
HIGH EFFICIENCY EPITAXIAL CHEMICAL VAPOR DEPOSITION (CVD) REACTOR
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