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    Title :

    Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability [4146-06]


    Contributors:
    Louis, E. (author) / Yakshin, A. E. (author) / Gorts, P. C. (author) / Oestreich, S. (author) / Maas, E. L. G. (author) / Kessels, M. J. H. (author) / Schmitz, D. (author) / Scholze, F. (author) / Ulm, G. (author) / Mullender, S. (author)

    Conference:

    Conference, Soft x-ray and EUV imaging systems ; 2000 ; San Diego, CA



    Publication date :

    2000-01-01


    Size :

    4 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Nr. 4146

    DataCite | 1925


    Multilayer reflectance during exposure to EUV radiation [4146-07]

    Oestreich, S. / Klein, R. / Scholze, F. et al. | British Library Conference Proceedings | 2000


    Si-based multilayers with high thermal stability [4146-23]

    Kaiser, N. / Yulin, S. / Feigl, T. et al. | British Library Conference Proceedings | 2000


    DUV or EUV: that is the question [4146-01]

    Williamson, D. M. / SPIE | British Library Conference Proceedings | 2000


    High-resolution soft x-ray microscopy [4146-24]

    Chao, W. / Anderson, E. H. / Denbeaux, G. et al. | British Library Conference Proceedings | 2000