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    Title :

    Multilayer reflectance during exposure to EUV radiation [4146-07]


    Contributors:
    Oestreich, S. (author) / Klein, R. (author) / Scholze, F. (author) / Jonkers, J. (author) / Louis, E. (author) / Yakshin, A. E. (author) / Gorts, P. C. (author) / Ulm, G. (author) / Haidl, M. (author) / Bijkerk, F. (author)

    Conference:

    Conference, Soft x-ray and EUV imaging systems ; 2000 ; San Diego, CA



    Publication date :

    2000-01-01


    Size :

    8 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Nr. 4146

    DataCite | 1925


    Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability [4146-06]

    Louis, E. / Yakshin, A. E. / Gorts, P. C. et al. | British Library Conference Proceedings | 2000


    High-resolution soft x-ray microscopy [4146-24]

    Chao, W. / Anderson, E. H. / Denbeaux, G. et al. | British Library Conference Proceedings | 2000


    Portable diagnostics for EUV light sources [4146-13]

    Stuik, R. / Constantinescu, R. C. / Hegeman, P. et al. | British Library Conference Proceedings | 2000


    DUV or EUV: that is the question [4146-01]

    Williamson, D. M. / SPIE | British Library Conference Proceedings | 2000