Access

    Access via TIB

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Liquid-target laser-plasma sources for EUV and x-ray lithography (Invited Paper) [3767-01]



    Conference:

    Conference, EUV, X-ray, and neutron optics and sources ; 1999 ; Denver, CO



    Publication date :

    1999-01-01


    Size :

    8 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Polycapillary collimator for laser-generated plasma source x-ray lithography [3767-05]

    Chen, Z. W. / Youngman, R. / Bievenue, T. et al. | British Library Conference Proceedings | 1999


    High-uniformity collimator for x-ray proximity lithography [3767-06]

    Cash, W. C. / SPIE | British Library Conference Proceedings | 1999


    Nr. 3767

    DataCite | 1917


    Testing of glancing incidence mirrors using sampled profile measurements (Invited Paper) [3767-16]

    Church, E. L. / Takacs, P. Z. / SPIE | British Library Conference Proceedings | 1999


    High-power source and illumination system for extreme ultraviolet lithography [3767-20]

    Kubiak, G. D. / Bernardez, L. J. / Krenz, K. D. et al. | British Library Conference Proceedings | 1999