Access

    Access via TIB

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    High-power source and illumination system for extreme ultraviolet lithography [3767-20]



    Conference:

    Conference, EUV, X-ray, and neutron optics and sources ; 1999 ; Denver, CO



    Publication date :

    1999-01-01


    Size :

    7 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Multilayer coated optics for an alpha-class extreme ultraviolet lithography system [3767-31]

    Montcalm, C. / Grabner, R. F. / Hudyma, R. M. et al. | British Library Conference Proceedings | 1999


    Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography [3767-37]

    Bajt, S. / Behymer, R. D. / Mirkarimi, P. B. et al. | British Library Conference Proceedings | 1999


    High-power x-ray point source for next-generation lithography [3767-03]

    Turcu, I. C. E. / Forber, R. A. / Grygier, R. K. et al. | British Library Conference Proceedings | 1999


    High-uniformity collimator for x-ray proximity lithography [3767-06]

    Cash, W. C. / SPIE | British Library Conference Proceedings | 1999


    Polycapillary collimator for laser-generated plasma source x-ray lithography [3767-05]

    Chen, Z. W. / Youngman, R. / Bievenue, T. et al. | British Library Conference Proceedings | 1999