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    Title :

    Multilayer coated optics for an alpha-class extreme ultraviolet lithography system [3767-31]



    Conference:

    Conference, EUV, X-ray, and neutron optics and sources ; 1999 ; Denver, CO



    Publication date :

    1999-01-01


    Size :

    7 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Experimental investigation of beryllium-based multilayer coatings for extreme ultraviolet lithography [3767-37]

    Bajt, S. / Behymer, R. D. / Mirkarimi, P. B. et al. | British Library Conference Proceedings | 1999


    High-power source and illumination system for extreme ultraviolet lithography [3767-20]

    Kubiak, G. D. / Bernardez, L. J. / Krenz, K. D. et al. | British Library Conference Proceedings | 1999


    Neutron multilayer structures for fundamental experiments in UCN optics [3767-49]

    Frank, A. I. / Balashov, S. V. / Bodnarchuk, V. I. et al. | British Library Conference Proceedings | 1999


    Novel condenser for EUV lithography ring-field projection optics [3767-33]

    Chapman, H. N. / Nugent, K. A. / SPIE | British Library Conference Proceedings | 1999


    Laterally graded multilayer optics for x-ray analysis [3767-27]

    Schuster, M. R. / Gobel, H. / Brugemann, L. et al. | British Library Conference Proceedings | 1999