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    Title :

    High-uniformity collimator for x-ray proximity lithography [3767-06]


    Contributors:

    Conference:

    Conference, EUV, X-ray, and neutron optics and sources ; 1999 ; Denver, CO



    Publication date :

    1999-01-01


    Size :

    8 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Polycapillary collimator for laser-generated plasma source x-ray lithography [3767-05]

    Chen, Z. W. / Youngman, R. / Bievenue, T. et al. | British Library Conference Proceedings | 1999


    Review of x-ray collimators for x-ray proximity lithography [3767-24]

    Lane, S. M. / Barbee, T. W. / Mrowka, S. J. et al. | British Library Conference Proceedings | 1999


    Nr. 3767

    DataCite | 1917


    High-power source and illumination system for extreme ultraviolet lithography [3767-20]

    Kubiak, G. D. / Bernardez, L. J. / Krenz, K. D. et al. | British Library Conference Proceedings | 1999


    High-power x-ray point source for next-generation lithography [3767-03]

    Turcu, I. C. E. / Forber, R. A. / Grygier, R. K. et al. | British Library Conference Proceedings | 1999