Zugriff

    Zugriff über TIB

    Verfügbarkeit in meiner Bibliothek prüfen

    Bestellung bei Subito €


    Exportieren, teilen und zitieren



    Titel :

    Liquid-target laser-plasma sources for EUV and x-ray lithography (Invited Paper) [3767-01]


    Beteiligte:

    Kongress:

    Conference, EUV, X-ray, and neutron optics and sources ; 1999 ; Denver, CO



    Erscheinungsdatum :

    01.01.1999


    Format / Umfang :

    8 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Polycapillary collimator for laser-generated plasma source x-ray lithography [3767-05]

    Chen, Z. W. / Youngman, R. / Bievenue, T. et al. | British Library Conference Proceedings | 1999


    Nr. 3767

    DataCite | 1917


    Testing of glancing incidence mirrors using sampled profile measurements (Invited Paper) [3767-16]

    Church, E. L. / Takacs, P. Z. / SPIE | British Library Conference Proceedings | 1999


    High-power source and illumination system for extreme ultraviolet lithography [3767-20]

    Kubiak, G. D. / Bernardez, L. J. / Krenz, K. D. et al. | British Library Conference Proceedings | 1999


    Multilayer coated optics for an alpha-class extreme ultraviolet lithography system [3767-31]

    Montcalm, C. / Grabner, R. F. / Hudyma, R. M. et al. | British Library Conference Proceedings | 1999