Synonyme wurden verwendet für:
data
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data storage
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for
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industries
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metrology
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semiconductor,
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storage
Suche ohne Synonyme:
title: Optical metrology roadmap for the semiconductor, optical, and data storage industries
Optical metrology roadmap for the semiconductor, optical, and data storage industries
Ellipsometry: a sophisticated tool for optical metrology (Invited Paper) [4099-23]
Optical microscopy at sub-0.1-mum resolution for semiconductor applications [4099-03]
2D-area/3D-volume holographic optical storage nanotechnology [4099-22]
Evaluating optical and supersmooth surface using AFM in optical manufacturing technology [4099-07]
Advanced methods for surface and subsurface defect characterization of optical components [4099-34]
Present and future interference microscope systems for magnetic head metrology [4099-21]
New procedure for the optical characterization of high-quality thin films [4099-16]
Optical characterization of doping profiles in silicon [4099-04]
Measurement of absorptance of optical coatings for F~2 lithography [4449-02]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]
Measurement of total integrated scatter of optical coatings for 157-nm lithography [4449-04]
DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]
Optical testing of long cylindrical lenses by means of scanning deflectometry [4099-17]
Investigations of transmittance and reflectance in the DUV/VUV spectral range [4099-36]
X-ray study of the roughness of surfaces and interfaces [4099-12]
Calibration requirements for identifying and sizing wafer defects by scanner measurements [4099-38]
Measurement of the elastic constants of nanometric films [4449-16]
Fast-scanning ellipsometry for thin film characterization [4099-39]
Diffractive solid immersion lenses: characterization and manufacturing [4449-29]
Numerical investigation of the resolution in solid immersion lens systems [4099-28]
X-ray study of surfaces and interfaces [4449-31]
Automated high-accuracy measuring system for specular microreflectivity [4449-15]
Effects of particle shape on particle identification and scatter predictions [4449-18]
Calibration tool for a CCD-camera-based vision system [4099-19]
Accuracy of the thin metallic wires diameter using Fraunhofer diffraction technique [4099-31]
Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]
Microroughness analysis of thin film components for VUV applications [4099-13]
Variable angle spectroscopic ellipsometry in the vacuum ultraviolet (Invited Paper) [4099-24]
Investigation on total scattering at 157 nm and 193 nm [4099-09]