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Measurement of total integrated scatter of optical coatings for 157-nm lithography [4449-04]
Diffractive solid immersion lenses: characterization and manufacturing [4449-29]
AFM tip calibration using nanometer-sized structures induced by ion beam sputtering [4449-28]
Measurement of absorptance of optical coatings for F~2 lithography [4449-02]
Polarized light scattering from metallic particles on silicon wafers [4449-39]
Measurement of the elastic constants of nanometric films [4449-16]
Stitching interferometry of aspherical surfaces [4449-34]
Accurate sizing of deposited PSL spheres from light scatter measurements [4449-19]
Quasi-confocal extended field surface sensing [4449-23]
Automated high-accuracy measuring system for specular microreflectivity [4449-15]
X-ray study of surfaces and interfaces [4449-31]
Effects of particle shape on particle identification and scatter predictions [4449-18]
Fast-scanning ellipsometry for thin film characterization [4099-39]
Numerical investigation of the resolution in solid immersion lens systems [4099-28]
Present and future interference microscope systems for magnetic head metrology [4099-21]
New procedure for the optical characterization of high-quality thin films [4099-16]
X-ray study of the roughness of surfaces and interfaces [4099-12]
Variable angle spectroscopic ellipsometry in the vacuum ultraviolet (Invited Paper) [4099-24]
2D-area/3D-volume holographic optical storage nanotechnology [4099-22]
Microstructure of thin films: correlation with laser damage threshold [4449-35]
Use of light scatter signals to identify particle material (Invited Paper) [4449-17]
Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]
Investigations of transmittance and reflectance in the DUV/VUV spectral range [4099-36]
X-ray investigations of a near surface layer of metal samples [4099-33]
Optical testing of long cylindrical lenses by means of scanning deflectometry [4099-17]
Evaluating optical and supersmooth surface using AFM in optical manufacturing technology [4099-07]
Lithography: a look at what is ahead (Invited Paper) [4099-01]
Measurement of steep aspheres: a step forward to nanometer accuracy [4449-25]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]
Advanced methods for surface and subsurface defect characterization of optical components [4099-34]
Accuracy of the thin metallic wires diameter using Fraunhofer diffraction technique [4099-31]
Ellipsometry: a sophisticated tool for optical metrology (Invited Paper) [4099-23]
Calibration tool for a CCD-camera-based vision system [4099-19]