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    Titel :

    Lithography: a look at what is ahead (Invited Paper) [4099-01]



    Kongress:

    Conference, Optical metrology roadmap for the semiconductor, optical, and data storage industries ; 2000 ; San Diego, CA



    Erscheinungsdatum :

    2000-01-01


    Format / Umfang :

    15 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Standardization in optics characterization (Invited Paper) [4099-14]

    Ristau, D. / SPIE | British Library Conference Proceedings | 2000


    Variable angle spectroscopic ellipsometry in the vacuum ultraviolet (Invited Paper) [4099-24]

    Woollam, J. A. / Hilfiker, J. N. / Tiwald, T. E. et al. | British Library Conference Proceedings | 2000


    Nr. 4099

    DataCite | 1924


    Ellipsometry: a sophisticated tool for optical metrology (Invited Paper) [4099-23]

    Azzam, R. M. A. / SPIE | British Library Conference Proceedings | 2000


    DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]

    Gliech, S. / Steinert, J. / Flemming, M. et al. | British Library Conference Proceedings | 2000