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    Titel :

    DUV/VUV light scattering measurement of optical components for lithography applications [4099-10]


    Beteiligte:

    Kongress:

    Conference, Optical metrology roadmap for the semiconductor, optical, and data storage industries ; 2000 ; San Diego, CA



    Erscheinungsdatum :

    01.01.2000


    Format / Umfang :

    8 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




    Nr. 4099

    DataCite | 1924


    Lithography: a look at what is ahead (Invited Paper) [4099-01]

    Levinson, H. J. / SPIE | British Library Conference Proceedings | 2000


    Optical microscopy at sub-0.1-mum resolution for semiconductor applications [4099-03]

    Vollrath, W. / SPIE | British Library Conference Proceedings | 2000


    Advanced methods for surface and subsurface defect characterization of optical components [4099-34]

    Steinert, J. / Gliech, S. / Wuttig, A. et al. | British Library Conference Proceedings | 2000


    Investigation on total scattering at 157 nm and 193 nm [4099-09]

    Kadkhoda, P. / Welling, H. / Gunster, S. et al. | British Library Conference Proceedings | 2000