This paper addresses the specific issue of optical proximity correction (OPC) used in large array pillar type two-dimensional photonic crystal fabrication by deep UV lithography for a nonsequential technique amenable for batch fabrication.
248 nm lithography of 2D photonic crystal waveguide with proximity correction
01.01.2004
254584 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
WB2.6 248nm Lithography of 2D Photonic Crystal Waveguide with Optical Proximity Correction
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