We demonstrate deep UV lithography at 248 nm to be a useful fabrication tool for nanophotonics, including photonic crystals, operating at telecom wavelengths. The structures are of high quality, and first results show low propagation losses.


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    Titel :

    Deep UV lithography for planar photonic crystal structures


    Beteiligte:
    Bogaerts, W. (Autor:in) / Dumon, P. (Autor:in) / Van Campenhout, J. (Autor:in) / Wiaux, V. (Autor:in) / Wouters, J. (Autor:in) / Beckx, S. (Autor:in) / Taillaert, D. (Autor:in) / Luyssaert, B. (Autor:in) / Van Thourhout, D. (Autor:in) / Baets, R. (Autor:in)


    Erscheinungsdatum :

    2003-01-01


    Format / Umfang :

    233556 byte





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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