We demonstrate deep UV lithography at 248 nm to be a useful fabrication tool for nanophotonics, including photonic crystals, operating at telecom wavelengths. The structures are of high quality, and first results show low propagation losses.


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    Title :

    Deep UV lithography for planar photonic crystal structures


    Contributors:
    Bogaerts, W. (author) / Dumon, P. (author) / Van Campenhout, J. (author) / Wiaux, V. (author) / Wouters, J. (author) / Beckx, S. (author) / Taillaert, D. (author) / Luyssaert, B. (author) / Van Thourhout, D. (author) / Baets, R. (author)


    Publication date :

    2003-01-01


    Size :

    233556 byte





    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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