This paper addresses the specific issue of optical proximity correction (OPC) used in large array pillar type two-dimensional photonic crystal fabrication by deep UV lithography for a nonsequential technique amenable for batch fabrication.
248 nm lithography of 2D photonic crystal waveguide with proximity correction
2004-01-01
254584 byte
Conference paper
Electronic Resource
English
WB2.6 248nm Lithography of 2D Photonic Crystal Waveguide with Optical Proximity Correction
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