This paper addresses the specific issue of optical proximity correction (OPC) used in large array pillar type two-dimensional photonic crystal fabrication by deep UV lithography for a nonsequential technique amenable for batch fabrication.


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    Title :

    248 nm lithography of 2D photonic crystal waveguide with proximity correction


    Contributors:
    Teo, H.G. (author) / Yu, M.B. (author) / Doan, M.T. (author) / Singh, J. (author) / Singh, S. (author) / Sun, H.Q. (author) / Liu, A.Q. (author)


    Publication date :

    2004-01-01


    Size :

    254584 byte





    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English




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