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title: Optical metrology roadmap for the semiconductor, optical, and data storage industries
Optical metrology roadmap for the semiconductor, optical, and data storage industries
Measurement of absorptance of optical coatings for F~2 lithography [4449-02]
IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]
Measurement of total integrated scatter of optical coatings for 157-nm lithography [4449-04]
Measurement of the elastic constants of nanometric films [4449-16]
Diffractive solid immersion lenses: characterization and manufacturing [4449-29]
X-ray study of surfaces and interfaces [4449-31]
Automated high-accuracy measuring system for specular microreflectivity [4449-15]
Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]
Effects of particle shape on particle identification and scatter predictions [4449-18]