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    Title :

    Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm [4449-06]


    Contributors:

    Conference:

    Conference; 2nd, Optical metrology roadmap for the semiconductor, optical, and data storage industries ; 2001 ; San Diego, CA



    Publication date :

    2001-01-01


    Size :

    11 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English





    IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]

    Boher, P. / Bucchia, M. / Piel, J. P. et al. | British Library Conference Proceedings | 2001


    New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm [4099-25]

    Boher, P. / Evrard, P. / Piel, J.-P. et al. | British Library Conference Proceedings | 2000


    Nr. 4449

    DataCite | 1930


    Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool [4449-10]

    Boher, P. / Piel, J. P. / Stehle, J. L. et al. | British Library Conference Proceedings | 2001