Report reviews experimental research on plasma-deposited films of hydrogenated amorphous carbon. Such films exhibit electrical resistivity, semi-transparency, mechanical hardness, and chemical inertness. Useful as gate dielectrics and passivating layers in semiconductor devices, insulators for metal/insulator/metal devices, and masks in nanometer lithography. Show promise as wear-resistant, hard solid lubricating coats for bearings and optical components.
Properties Of Plasma-Deposited Amorphous Hydrogenated Carbon
NASA Tech Briefs ; 17 , 4
1992-04-01
Miscellaneous
No indication
English
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