Report reviews experimental research on plasma-deposited films of hydrogenated amorphous carbon. Such films exhibit electrical resistivity, semi-transparency, mechanical hardness, and chemical inertness. Useful as gate dielectrics and passivating layers in semiconductor devices, insulators for metal/insulator/metal devices, and masks in nanometer lithography. Show promise as wear-resistant, hard solid lubricating coats for bearings and optical components.


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    Titel :

    Properties Of Plasma-Deposited Amorphous Hydrogenated Carbon


    Beteiligte:

    Erschienen in:

    Erscheinungsdatum :

    01.04.1992



    Medientyp :

    Sonstige


    Format :

    Keine Angabe


    Sprache :

    Englisch


    Schlagwörter :




    Rapid Annealing Of Amorphous Hydrogenated Carbon

    Alterovitz, Samuel A. / Pouch, John J. / Warner, Joseph D. | NTRS | 1989



    Optical Properties of Hydrogenated Amorphous Carbon Determined by Ellipsometry [3573-114]

    Koos, M. / Lohner, T. / Moustafa, S. H. et al. | British Library Conference Proceedings | 1998