An overview of the state of the art of processing silicon for use as infrared detectors is presented. Improvements in the process that could be obtained in a low-g environment were examined. The various requirements for the different types of Si detector materials are summarized.


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    Title :

    Float zone silicon for IR detectors


    Contributors:
    Kern, E. L. (author)


    Publication date :

    1980-12-01


    Type of media :

    Conference paper


    Type of material :

    No indication


    Language :

    English




    Float Zone Workshop

    E. L. Kern / E. K. Cothran | NTRS | 1981


    Float Zone Workshop

    R. J. Naumann | NTIS | 1980


    Float Zone Workshop

    Naumann, R. J. | NTRS | 1980


    Float Zone Workshop

    E. L. Kern / E. K. Cothran | NTIS | 1981