High-speed etching of single-crystal 6H-SiC by femtosecond Ti:sapphire laser ablation was demonstrated. Fine line pattern of 60 /spl mu/m in depth was fabricated with relatively smooth etched surface with little damage.
Micromachining of SiC by femtosecond laser ablation
2001-01-01
147119 byte
Conference paper
Electronic Resource
English
Femtosecond laser micromachining of sapphire
IEEE | 2001
|ThM3 Femtosecond Laser Micromachining of Sapphire
British Library Conference Proceedings | 2001
|Femtosecond laser micromachining of submicron features
IEEE | 2003
|Precise Micromachining with Femtosecond Laser Pulses
British Library Online Contents | 1997
|