A technique for monolithic integration of silica-based waveguides and optoelectronic components has been developed. The low temperature fabrication budget necessary to preserve the optoelectronic devices is obtained through the use the hollow cathode plasma enhanced CVD technique.
Techniques for monolithic integration of silica-based waveguide devices with optoelectronics
1998-01-01
276921 byte
Conference paper
Electronic Resource
English
Techniques for Monolithic Integration of Silica-Based Waveguide Devices with Optoelectronics
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