This paper demonstrates a fabrication process which allows the location and geometry of quantum dots to be explicitly defined using electron beam lithography and selective area metal-organic chemical vapor deposition crystal growth. In this study, these fabrication processes are described and results are presented demonstrating significantly improved performance of laser devices containing a patterned quantum dot active layer.


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    Title :

    Patterned quantum dot lasers fabricated using electron beam lithography and selective area epitaxial growth


    Contributors:
    Elarde, V.C. (author) / Coleman, J.J. (author) / Bryce, A.C. (author)


    Publication date :

    2005-01-01


    Size :

    264594 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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