This paper demonstrates a fabrication process which allows the location and geometry of quantum dots to be explicitly defined using electron beam lithography and selective area metal-organic chemical vapor deposition crystal growth. In this study, these fabrication processes are described and results are presented demonstrating significantly improved performance of laser devices containing a patterned quantum dot active layer.
Patterned quantum dot lasers fabricated using electron beam lithography and selective area epitaxial growth
2005-01-01
264594 byte
Conference paper
Electronic Resource
English
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