NSOM measurements of the intensity distribution as a function of transverse position have been carried out on AlGaAs ridge waveguides. The measurements were compared with both effective index method (EIM) and beam propagation method (BPM) calculations; the BPM was in better agreement with our experimental results. Finally, an in situ measure of the spatial resolution, here /spl sim/60 nm, was achieved by comparing the measurements near the ridge edge with the BPM predictions.


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    Title :

    Near field scanning optical microscopy measurements of optical intensity distributions in semiconductor channel waveguide



    Publication date :

    1996-01-01


    Size :

    169626 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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