NSOM measurements of the intensity distribution as a function of transverse position have been carried out on AlGaAs ridge waveguides. The measurements were compared with both effective index method (EIM) and beam propagation method (BPM) calculations; the BPM was in better agreement with our experimental results. Finally, an in situ measure of the spatial resolution, here /spl sim/60 nm, was achieved by comparing the measurements near the ridge edge with the BPM predictions.
Near field scanning optical microscopy measurements of optical intensity distributions in semiconductor channel waveguide
1996-01-01
169626 byte
Conference paper
Electronic Resource
English
British Library Conference Proceedings | 1996
|British Library Conference Proceedings | 1996
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