NSOM measurements of the intensity distribution as a function of transverse position have been carried out on AlGaAs ridge waveguides. The measurements were compared with both effective index method (EIM) and beam propagation method (BPM) calculations; the BPM was in better agreement with our experimental results. Finally, an in situ measure of the spatial resolution, here /spl sim/60 nm, was achieved by comparing the measurements near the ridge edge with the BPM predictions.
Near field scanning optical microscopy measurements of optical intensity distributions in semiconductor channel waveguide
01.01.1996
169626 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
British Library Conference Proceedings | 1996
|British Library Conference Proceedings | 1996
|British Library Conference Proceedings | 2001
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