NSOM measurements of the intensity distribution as a function of transverse position have been carried out on AlGaAs ridge waveguides. The measurements were compared with both effective index method (EIM) and beam propagation method (BPM) calculations; the BPM was in better agreement with our experimental results. Finally, an in situ measure of the spatial resolution, here /spl sim/60 nm, was achieved by comparing the measurements near the ridge edge with the BPM predictions.


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    Titel :

    Near field scanning optical microscopy measurements of optical intensity distributions in semiconductor channel waveguide



    Erscheinungsdatum :

    01.01.1996


    Format / Umfang :

    169626 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



    Near Field Scanning Optical Microscopy Measurements of Optical Intensity Distributions in Semiconductor Channel Waveguide

    IEEE; Lasers and Electro-Optics Society | British Library Conference Proceedings | 1996


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