We designed a refractive beam shaping element, which forms a line shaped beam out of a Gaussian output beam of a laser diode. Using a geometric optical method based on the thin element approximation (TEA), a refractive element with a height of 45 /spl mu/m and a foot print of about 1200/spl times/500 /spl mu/m was designed. The beam shaping efficiency we measured by 90%. The final element is fabricated in fused silica. We developed a process which keeps the surface profile and gives the resist the necessary stability for etching. With this process we achieved a high form stability of arbitrary profiles sufficient for the proportional transfer even by ICP-etching (inductive coupled plasma etching). Based on this technology we fabricated the beam shaping elements and lens arrays.


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    Title :

    Improved resist treatment for gray tone lithographic beam shaping element fabrication


    Contributors:
    Hartung, H. (author) / Cumme, M. (author) / Thieme, M. (author) / Kley, E.-B. (author) / Tunnerman, A. (author)


    Publication date :

    2003-01-01


    Size :

    71774 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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