We designed a refractive beam shaping element, which forms a line shaped beam out of a Gaussian output beam of a laser diode. Using a geometric optical method based on the thin element approximation (TEA), a refractive element with a height of 45 /spl mu/m and a foot print of about 1200/spl times/500 /spl mu/m was designed. The beam shaping efficiency we measured by 90%. The final element is fabricated in fused silica. We developed a process which keeps the surface profile and gives the resist the necessary stability for etching. With this process we achieved a high form stability of arbitrary profiles sufficient for the proportional transfer even by ICP-etching (inductive coupled plasma etching). Based on this technology we fabricated the beam shaping elements and lens arrays.
Improved resist treatment for gray tone lithographic beam shaping element fabrication
01.01.2003
71774 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
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