Optical near-field in subwavelength air-dielectric structure is studied by a collection-mode near-field optical microscopy. Concentrated optical near-field and large polarization anisotropy at the dielectric regions are measured. From the simulation of finite-difference time-domain method, we conclude the edge diffraction dominating the optical near-field distribution.


    Access

    Check access

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Edge diffraction induced near-field contrast in subwavelength structure


    Contributors:


    Publication date :

    2003-01-01


    Size :

    81184 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



    Edge diffraction induced near-field contrast in subwavelength structures

    Chou, H.-L. / Chen, Y.-C. / Wei, P.-K. et al. | British Library Conference Proceedings | 2003


    Subwavelength Electromagnetic-Field Narrowing

    Zuev, V. S. / Frantsesson, A. V. | British Library Online Contents | 1998


    Novel Surface Emitting Laser using High-Contrast Subwavelength Grating

    Ye Zhou, / Huang, M.C.Y. / Chang-Hasnain, C.J. | IEEE | 2006



    DMA5 Electromagnetic diffraction and subwavelength mask lithography: numerical feasibility study

    Ichikawa, H. / Kikuta, H. | British Library Conference Proceedings | 2000