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    Title :

    DMA5 Electromagnetic diffraction and subwavelength mask lithography: numerical feasibility study


    Contributors:
    Ichikawa, H. (author) / Kikuta, H. (author)

    Conference:

    Conference, Diffractive optics and micro-optics ; 2000 ; Quebec City, Canada



    Publication date :

    2000-01-01


    Size :

    4 pages


    Remarks:

    Also known as DOMO 2000




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




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