The epitaxial deposition by organometallic chemical vapor deposition (OMCVD) technique has advanced significantly, with the demonstration of excellent composition and thickness control down to the monolayer scale in the growth direction. As a result a variety of III-V materials systems have been used. In this talk, however, we will concentrate on some of the applications of OMCVD to advance the state-of-the-art of optoelectronics needed in the telecommunication industry.<>


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    Title :

    OMCVD growth for optoelectronics


    Contributors:
    Bhat, R. (author)

    Published in:

    Publication date :

    1993-01-01


    Size :

    194183 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English




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