The epitaxial deposition by organometallic chemical vapor deposition (OMCVD) technique has advanced significantly, with the demonstration of excellent composition and thickness control down to the monolayer scale in the growth direction. As a result a variety of III-V materials systems have been used. In this talk, however, we will concentrate on some of the applications of OMCVD to advance the state-of-the-art of optoelectronics needed in the telecommunication industry.<>


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    Titel :

    OMCVD growth for optoelectronics


    Beteiligte:
    Bhat, R. (Autor:in)

    Erschienen in:

    Erscheinungsdatum :

    01.01.1993


    Format / Umfang :

    194183 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch




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