The epitaxial deposition by organometallic chemical vapor deposition (OMCVD) technique has advanced significantly, with the demonstration of excellent composition and thickness control down to the monolayer scale in the growth direction. As a result a variety of III-V materials systems have been used. In this talk, however, we will concentrate on some of the applications of OMCVD to advance the state-of-the-art of optoelectronics needed in the telecommunication industry.<>
OMCVD growth for optoelectronics
Proceedings of LEOS '93 ; 421-422
01.01.1993
194183 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
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