A new method of patterning photonic crystal (PhC) structures by single-spot electron-beam exposure scheme is presented. An order-of-magnitude reduction in the required job time compared to that for the conventional multispot scheme has been achieved.
Generation of photonic crystal patterns by single-spot electron beam lithography
2003-01-01
264694 byte
Conference paper
Electronic Resource
English
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British Library Conference Proceedings | 2003
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