A new method of patterning photonic crystal (PhC) structures by single-spot electron-beam exposure scheme is presented. An order-of-magnitude reduction in the required job time compared to that for the conventional multispot scheme has been achieved.


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    Title :

    Generation of photonic crystal patterns by single-spot electron beam lithography


    Contributors:
    Kim, S. (author) / Chong, H. (author) / De La Rue, R.M. (author) / Marsh, J.H. (author) / Bryce, A.C. (author)


    Publication date :

    2003-01-01


    Size :

    264694 byte



    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English





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