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    Title :

    Basis of macro/micro-machining and polishing of semiconductor materials using high etch rate plasma assisted chemical etching


    Contributors:
    Zarowin, C. (author)

    Conference:

    34th Aerospace Sciences Meeting and Exhibit ; 1996 ; Reno , NV , U.S.A.



    Publication date :

    1996-01-01



    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English





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