Basis of macro/micro-machining and polishing of semiconductor materials using high etch rate plasma assisted chemical etching
34th Aerospace Sciences Meeting and Exhibit ; 1996 ; Reno , NV , U.S.A.
1996-01-01
Conference paper
Electronic Resource
English
British Library Conference Proceedings | 2001
|British Library Online Contents | 2002
|'Machining' aluminum by etching
Engineering Index Backfile | 1954
|`Machining' aluminum by etching
Engineering Index Backfile | 1954
|