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    Title :

    Characterization method for new resist formulations for HAR patterns made by X-ray lithography


    Contributors:
    Kunka, D. (author) / Mohr, J. r. (author) / Nazmov, V. (author) / Meiser, J. (author) / Meyer, P. (author) / Amberger, M. (author) / Koch, F. (author) / Schulz, J. (author) / Walter, M. (author) / Duttenhofer, T. (author)

    Published in:

    MICROSYSTEM TECHNOLOGIES ; 20 , 10-11 ; 2023-2029


    Publication date :

    2014-01-01


    Size :

    7 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    629.83



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