Characterization method for new resist formulations for HAR patterns made by X-ray lithography
MICROSYSTEM TECHNOLOGIES ; 20 , 10-11 ; 2023-2029
2014-01-01
7 pages
Article (Journal)
English
DDC: | 629.83 |
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Resist-based neutral atom lithography
British Library Conference Proceedings | 1998
|Deep photo-lithography characterization of SU-8 resist layers
British Library Online Contents | 2005
|SU-8 as resist material for deep X-ray lithography
British Library Online Contents | 2001
|Investigation to Ultra-Resolution Resist in Room-Temperature Imprint Lithography
British Library Online Contents | 2003
|Etching Process for Residual Resist Layer in Ultraviolet-Imprint Lithography
British Library Online Contents | 2006
|