Access

    Access via TIB

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    SU-8 as resist material for deep X-ray lithography


    Contributors:
    Cremers, C. (author) / Bouamrane, F. (author) / Singleton, L. (author) / Schenk, R. (author)

    Published in:

    Publication date :

    2001-01-01


    Size :

    6 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    629.83



    Deep photo-lithography characterization of SU-8 resist layers

    Reznikova, E. F. / Mohr, J. / Hein, H. | British Library Online Contents | 2005


    Resist-based neutral atom lithography

    Thywissen, J. H. / Johnson, K. S. / Younkin, R. et al. | British Library Conference Proceedings | 1998


    Influence of mask substrate materials on resist sidewall roughness in deep X-ray lithography

    Aigeldinger, G. / Yang, C. Y. / Skala, D. M. et al. | British Library Online Contents | 2008


    Simulation of deep UV lithography with SU-8 resist by using 365 nm light source

    Tian, X. / Liu, G. / Tian, Y. et al. | British Library Online Contents | 2005


    Etching Process for Residual Resist Layer in Ultraviolet-Imprint Lithography

    Yongsheng, S. / Yucheng, D. / Bingheng, L. | British Library Online Contents | 2006