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    Title :

    Simulation of deep UV lithography with SU-8 resist by using 365 nm light source


    Contributors:
    Tian, X. (author) / Liu, G. (author) / Tian, Y. (author) / Zhang, P. (author) / Zhang, X. (author)

    Published in:

    MICROSYSTEM TECHNOLOGIES ; 11 , 4/5 ; 265-270


    Publication date :

    2005-01-01


    Size :

    6 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    629.83



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