Simulation of deep UV lithography with SU-8 resist by using 365 nm light source
MICROSYSTEM TECHNOLOGIES ; 11 , 4/5 ; 265-270
01.01.2005
6 pages
Aufsatz (Zeitschrift)
Englisch
| DDC: | 629.83 |
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Deep photo-lithography characterization of SU-8 resist layers
| British Library Online Contents | 2005
SU-8 as resist material for deep X-ray lithography
| British Library Online Contents | 2001
Resist-based neutral atom lithography
| British Library Conference Proceedings | 1998
Influence of mask substrate materials on resist sidewall roughness in deep X-ray lithography
| British Library Online Contents | 2008
Etching Process for Residual Resist Layer in Ultraviolet-Imprint Lithography
| British Library Online Contents | 2006